Chemraz 629
Chemraz ® 629 is developed from an advanced polymer using fluoro-polymer nano-composite technology particles. Recommended for both static and dynamic dry wafer processing applications such as etch, remote plasma cleans, and deposition (CVD, HDPCVD) with challenging gland designs and reduced sealing loads, it remains stable at service temps to 500°F (260°C).
一般属性
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Technical Datasheet (English)
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