Greene Tweed’s Chemraz ® 504, a 65 Shore A hardness perfluoroelastomer, provides an extremely broad range of chemical resistance and is perfect for services with low pressures and/or low temperatures. Chemraz ® 504 seals effectively in temperatures ranging from -22°F to 446°F (-30°C to 230°C). Chemraz ® 504 is well suited for a variety of applications, from mechanical seals to valve housings. Chemraz ® 504 is available for use as o-rings, gaskets, and many other custom shapes. Because of its versatility, Chemraz ® 504 is often used as a standard compound and can be found in a variety of fluids and solutions, including acids, caustics, aldehydes, esters, aromatics, hot water, steam, amines, methanol, ketones, TBA, and MTBE.

Greene Tweed’s Chemraz ® 505, a perfluoroelastomer, provides a broad range of chemical resistance, and is available for use as o-rings, gaskets, and many other custom shapes. Because of its versatility, Chemraz ® 505 is often used as a standard compound and can be found in a variety of applications, including acids, caustics, aldehydes, esters, ethers, aromatics, hot water, steam, amines, methanol, ketones, TBA, and MTBE. With a temperature range of -22°F to 446°F (-30°C to 230°C), Chemraz ® 505 is ideal for processes in subzero temperatures and for use in multisubstance plants or in mixed media due to its broad chemical resistance.

Greene Tweed’s Chemraz ® 510, a perfluoroelastomer, offers an extremely broad range of chemical resistance with a Shore A hardness value of 90. With a tempera-ture range from -22°F to 446°F (-30°C to 230°C), Chemraz ® 510 is well suited for use in a range of applications, from mechanical seals to pump housings. Because of its versatility, Chemraz ® 510 is often used as a standard compound for sealing at high pressures. It can be found in a variety of fluids and solutions including acids, caustics, aldehydes, esters, aromatics, hot water, steam, amines, methanol, ketones, TBA, and MTBE. Chemraz ® 510 is available for use as o-rings, gaskets, and many other custom shapes.

Chemraz ® 513 is recommended for a wide variety of semiconductor equipment dry processing applications where seal reliability with minimal contamination is required. The material offers excellent performance in static plasma, photolithography, and diffusion processes where temperatures do not exceed 410°F (210°C) and high-sealing loads are not used. The hardness of this material allows for some hardware finish inconsistency.

Greene Tweed’s Chemraz ® 514, a perfluoroelastomer, is a white specialty compound, perfect for applications where contamination from carbon black must be prevented. Chemraz ® 514 offers a Shore A hardness value of 70. Because of its wide temperature range, -22°F to 428°F (-30°C to 220°C), Chemraz ® 514 is ideally suited for applications ranging from mechanical seals to valves. Available for use as o-rings, gaskets, and many other custom shapes.

Greene Tweed’s Chemraz ® 517, a perfluoroelastomer, is a white specialty compound, perfect for applications where contamination from carbon black must be prevented. Chemraz ® 517 has a Shore A hardness value of 80. Because of its wide temperature range, -22°F to 428°F (-30°C to 220°C), Chemraz ® 517 is well suited for use in a range of applications, from mechanical seals to mixers. Available for use as o-rings, gaskets, and many other custom shapes.

Chemraz ® 520 is recommended for a wide variety of semiconductor equipment dry processing applications where seal reliability with minimal contamination is required. Chemraz ® 520 offers excellent performance in static and dynamic plasma and diffusion processes as well as static photolithography processes. Chemraz ® 520 is formulated for use in high sealing load applications and where temperatures do not exceed 464°F (240°C). Due to the hardness of this material, low-temperature applications may require smoother hardware surface finishes of 10 microinches (Ra) and below.

Greene Tweed’s Chemraz ® 541 is a universal, high-strength black compound designed for demanding applications. It boasts excellent chemical and compression set resistance and operates at temperatures up to 446°F/230°C. Thanks to its broad chemical compatibility, temperature range, and shape versatility, Chemraz ® 541 is an ideal choice for demanding environments and processes. Chemraz ® 541 maintains its properties when exposed to acids, acrylates, alcohols, aldehydes, amines, aromatics, esters, ethers, halogens, ketones, hot water, and steam. We leverage compounding experience, manufacturing expertise, and engineering knowledge to ensure customers receive the optimal material and design for their application. Greene Tweed's scientists and engineers are careful and methodical in the development of new compounds, undertaking numerous studies of processing variability to ensure our manufacturing team can deliver a consistent, quality product.

Chemraz ® 543 is recommended for a wide variety of semiconductor equipment dry processing applications where seal reliability with minimal contamination is required. It offers excellent performance in etching, metalization, and diffusion processes where temperatures do not exceed 410°F (210°C). The hardness of this material allows for some hardware finish inconsistency.

Chemraz ® 550 is recommended for use in wet systems where chemical compatibility is required and small amounts of contamination are acceptable. This seal material has a wide variety of uses in dynamic or static processing equipment applications with service temperatures up to 410°F (210°C).

With its broad chemical resistance, Chemraz ® 551 is ideally suited as a universal sealing material for both aqueous and dry semiconductor wafer processing and chemical/DI water distribution systems. With the lowest outgassing profile for perfluoroelastomer materials in high-temperature applications, Chemraz ® 551 provides a cleaner process environment. Because of its reduced surface stiction, it can be used for semi-dynamic and static applications. Chemraz ® 551 remains stable at operating temperatures up to 572°F (300°C), while maintaining exceptional compression set. Chemraz ® 551 provides a significantly wider operational band and superior compression set resistance than any other broad range perfluoroelastomer on the market. With an upper temperature limit of 600°F (316°C), it’s the elastomer of choice for the most demanding applications from ozonated DI water to hot sulfuric resist strip. Chemraz ® 551 withstands the extreme thermal challenges typically found in LPCVD (low-pressure chemical vapor deposition), RTP (rapid thermal process), and epitaxial deposition systems. Chemraz ® 551's broad chemical resistance and high-temperature performance result in increased seal integrity, longer seal lifetimes, reduced downtimes, and higher wafer processing yields.

With its broad chemical resistance, Chemraz ® 555, a perfluoroelastomer, is ideally suited for challenging fluid handling applications. Chemraz ® 555 provides a significantly wider operational band and superior compression set resistance than any other broad range perfluoroelastomer on the market. With an upper temperature limit of 600°F (316°C), Chemraz ® 555 is the elastomer of choice for the most demanding services found in the chemical process and refining industries and semiconductor SubFabs. Chemraz ® 555 is suitable for use in a wide variety of media, including acids, caustics, aldehydes, esters, ethers, aromatics, hot water, steam, amines, methanol, ketones, TBA, MTBE, and mixed process streams. Chemraz ® 555 is one of Greene Tweed’s many cost-effective products and services that extend the reliability and life of our customers’ equipment in hostile conditions while protecting the public and the environment from unwanted emissions. Chemraz ® 555 is available in o-rings, gaskets, and many other custom shapes.

Chemraz ® 570 is recommended for a wide variety of semiconductor equipment wet processing applications where stringent seal reliability and contamination control is required. The material offers excellent performance in long-term static photolithography, acid/solvent, and ultrapure H2O applications.

Chemraz ® 571 is recommended for a wide variety of semiconductor equipment wet processing applications where stringent seal reliability and contamination control are required. It offers excellent performance in long-term static sealing applications in acid, solvent, and ultrapure H2O. Chemraz ® 571 is excellent for high-sealing load designs.

Greene Tweed’s Chemraz ® 584, a cream-colored perfluoroelastomer, is a specialty compound formulated to outlast the most demanding chemical process applications. Because of its outstanding overall chemical resistance, Chemraz ® 584 is the elastomer of choice for chlorine, ozone, strong oxidation fluids, and hot aqueous solutions. Its recommended temperature range is -22°F to 428°F (-30°C to 220°C). This unique cream compound is perfect for applications where contamination from carbon black must be prevented. Chemraz ® components are available for use as o-rings, gaskets, and many other custom shapes.

Chemraz ® 585, a perfluoroelastomer, is a specialty cream compound formulated to outlast the most demanding chemical process applications. With its outstanding overall chemical resistance, Chemraz ® 585 is the elastomer of choice for strong oxidation fluids and hot aqueous solutions. Its recommended temperature rangeis -22°F to 428°F (-30°C to 220°C). Chemraz ® components are available for use as o-rings, gaskets, and many other custom shapes.

Chemraz ® 592, a versatile perfluoroelastomer developed with a proprietary filler system, is very resistant to plasma attack. This compound’s durometer allows for some hardware finish inconsistency and higher sealing loads. It is well suited for critical seals in static and dynamic dry applications where reliability and purity are equally essential. Chemraz ® 592 is recommended for applications with service temperatures up to 464°F (240°C).

Chemraz ® 600, a perfluoroelastomer, works well in both high and low temperatures. It is capable of withstanding temperatures ranging from -4°F to 500°F (-20°C to 260°C). In addition, Chemraz ® 600 provides unparalleled performance in hot water and steam. Because of its high durometer rating (Shore A 90), components made from Chemraz ® 600 offer greater resistance in high-pressure and aggressive environments. Chemraz ® 600 has an extremely broad chemical resistance range and is made from a high-density base polymer. Chemraz ® 600 offers a low compression set and is perfect for sealing at high pressures. Components made from Chemraz ® 600 are available for use as o-rings, gaskets, and many other custom shapes.

Chemraz ® is a black synthetic rubber used to make high-performance seals and flexible parts with chemical and thermal compatibility similar to PTFE. Chemraz ® 605 is an ideal material for seals in in-vitro diagnostic (IVD), histology, analytical, and lab instrumentation. Seals made from Chemraz ® 605 maintain performance in nearly all relevant solvent and temperature combinations, typically for orders of magnitude longer than other seal materials, such as EPDM, silicone, or FKM.

Greene Tweed’s Chemraz ® 615 exhibits outstanding high temperature properties, with a temperature range from 0°F to 615°F (-18°C to 324°C). Chemraz ® 615’s chemical resistance and low compression set characteristics combine to out perform tin-cured FFKMs. Chemraz ® 615 shows lower compression set at high temperatures and a higher retained sealing force than other available FFKMs. Because Chemraz ® 615 allows for the use of higher process operating temperatures, it is ideal for a range of markets, from chemical process to petroleum refining. This superior FFKM performs well in a variety of fluids, such as inorganic and organic chemicals, acids, reagents, heat transfer fluids, and hydrocarbons. Chemraz ® 615 is available in standard o-rings and custom shapes for a range of equipment, from pumps and valves to agitators and mixers, from mechanical seals and process control instruments to heat exchangers and diagnostic equipment.

Chemraz ® 629 FFKM is specifically developed by Greene Tweed to meet the rigorous demands of aggressive plasma systems. Its unique formulation provides enhanced plasma resistance in oxygen and fluorine plasma processes, resulting in minimal contamination, less downtime, and higher wafer processing yields. Chemraz ® 629 is developed from an advanced polymer using fluoro-polymer nano-composite technology particles. Recommended for both static and dynamic dry wafer processing applications such as etch, remote plasma cleans, and deposition (CVD, HDPCVD) with challenging gland designs and reduced sealing loads, it remains stable at service temps to 500°F (260°C).

Chemraz ® 639 perfluoroelastomer is specifically developed by Greene Tweed to meet the rigorous demands of aggressive plasma systems. Its unique formulation provides enhanced plasma resistance in oxygen and fluorine plasma processes, resulting in minimal contamination, less downtime, and higher wafer processing yields. Chemraz ® 639 is developed from an advanced polymer using fluoro-polymer nano-composite technology particles. Recommended for both static and dynamic dry wafer processing applications such as etch, remote plasma cleans, and deposition (CVD, HDPCVD), Chemraz® 639 remains stable at service temperatures up to 500°F (260°C).

With its broad chemical resistance, Chemraz ® 555, a perfluoroelastomer, is ideally suited for challenging fluid handling applications. Chemraz ® 555 provides a significantly wider operational band and superior compression set resistance than any other broad range perfluoroelastomer on the market. With an upper temperature limit of 600°F (316°C), Chemraz ® 555 is the elastomer of choice for the most demanding services found in the chemical process and refining industries and semiconductor SubFabs. Chemraz ® 555 is suitable for use in a wide variety of media, including acids, caustics, aldehydes, esters, ethers, aromatics, hot water, steam, amines, methanol, ketones, TBA, MTBE, and mixed process streams. Chemraz ® 555 is one of Greene Tweed’s many cost-effective products and services that extend the reliability and life of our customers’ equipment in hostile conditions while protecting the public and the environment from unwanted emissions. Chemraz ® 555 is available in o-rings, gaskets, and many other custom shapes.

Chemraz ® 656 is a low durometer perfluoroelastomer primarily designed for bonded slit valve gates and special engineered applications such as low sealing forces/tolerance stackups where softer materials aid in the total seal solution. Developed from an advanced polymer using fluoropolymer nano-composite technology particles, Chemraz ® 656 has very low metallic ion levels and offers unsurpassed resistance to today’s advanced process chemistries. Chemraz ® 656 is recommended for use in CVD, etch, and diffusion equipment applications.

Specifically developed to meet the demands of aggressive dry plasma systems, Chemraz ® 657 perfluoroelastomer’s unique formulation provides enhanced plasma resistance and minimal contamination, resulting in less downtime and higher wafer processing yields. Recommended primarily for both static and dynamic oxide etch wafer processing applications, Chemraz ® 657 remains stable at service temperatures up to 536°F (280°C) with excursions to 572°F (300°C).

Chemraz ® 663, a perfluoroelastomer (FFKM), is engineered to withstand low-temperature Etch and Deposition applications where plasma resistance and the ability to maintain sealing force in a vacuum are critical, such as electrostatic chuck assemblies.

Chemraz ® E38 is specifically developed for high-density plasma systems and diffusion processes where seal reliability and minimal contamination are essential. It provides excellent chemical compatibility and withstands a variety of aggressive chemicals. Available in a range of geometries and cross-sections, Chemraz ® E38 offers the diversity required for dynamic or static dry processing applications. Recommended for slit valves, Chemraz ® E38 remains stable at service temperatures as high as 500°F (260°C) where high sealing loads are not used.

Chemraz ® SD517 is a white, high-purity, synthetic, fluorinated rubber with comparable chemical compatibility to polytetrafluoroethylene (PTFE). Chemraz ® SD517 is a choice material for high-performance seals and custom flexible shapes in pharma, biotech, and food applications with comprehensive compliance. In applications where EPDM, silicone, or FKM seals are unsuitable or require multiple replacement each year, Chemraz ® SD517 can dramatically improve process reliability and safety.

Chemraz ® SD625 is a black, synthetic, high-purity rubber with temperature and chemical compatibility similar to PTFE. Chemraz ® SD625 parts have high service temperatures (up to 500°F/260°C), near-universal chemical compatibility, and extensive compliance coverage. Chemraz ® SD625 is our best-performing seal material for pharma, biotech, cosmetic, and food processing applications. Chemraz ® SD625 seals have exceptional service lifetimes in steam-in-place (SIP) applications relative to FKM, silicone, and EPDM seals. Chemraz ® SD625 o-rings and gaskets typically maintain sealing after thousands of steam sterilization cycles, orders of magnitude longer than other materials.

Chemraz ® XCD, a perfluoroelastomer, is specifically designed to exceed the most rigorous demands of front-end semiconductor thermal processing equipment. Chemraz ® XCD withstands the extreme thermal challenges typically found in LPCVD (low pressure chemical vapor deposition), RTP (rapid thermal process), and epitaxial deposition systems. Because of its unique polymer and filler structure, Chemraz ® XCD provides the lowest compression set at high operating temperatures (> 572°F/300°C) of any perfluoroelastomer on the market, resulting in increased seal integrity and longer seal lifetimes. This means reduced downtime and higher wafer processing yields. With the lowest outgassing profile for perfluoroelastomer materials in high-temperature applications, Chemraz ® XCD provides a cleaner process environment. Because of its reduced surface stiction, Chemraz ® XCD can be used for semi-dynamic and static sealing applications. Chemraz ® XCD remains stable at operating temperatures up to 572°F (300°C) while maintaining exceptional compression set.

Protection against oxygen-infused plasma is key in many etch chamber environments. These harsh environments often break down non-resistant materials, causing harmful particulation and, ultimately, defective chips. Greene Tweed’s Chemraz ® XPE is highly resistant to O2 plasma and can be used in a wide range of applications, such as slit valve doors, reaction chamber lid seals, and gate valve seals. This advanced elastomeric material offers the semiconductor and solar industry an alternative to legacy products that quickly erode in the oxygen environment. With excellent resistance to both O2 and CF4 plasmas, this material affords an increased chip yield and maximized production. In addition, XPE seals provide customers with an increased MTBR (mean time between repair) to reduce downtime and maintenance costs.

Chemraz ® XRZ, a perfluoroelastomer, is specifically developed to exceed the most rigorous demands of aggressive in situ NF3 plasma cleaning. Chemraz ® XRZ withstands the application challenges typically found in HDPCVD (high-density plasma chemical vapor deposition), PECVD (plasma enhanced CVD), and newer PEALD (plasma-enhanced atomic layer deposition) process chambers. Because of its unique molecular composite structure, Chemraz ® XRZ provides the highest plasma resistance available to fluorine plasma processes, resulting in minimal contamination. This leads to increased seal integrity and longer seal lifetimes, reducing downtime and driving higher wafer processing yields. Chemraz ® XRZ can be used for both static and semi- dynamic dry wafer processing applications such as etch, deposition (CVD, HDPCVD, PEALD), and remote plasma cleans. Chemraz ® XRZ remains stable at operating temperatures up to 572°F (300°C) while maintaining exceptional compression set.

Chemraz ® XTR, a perfluoroelastomer, is specifically designed to withstand the highly corrosive environments that commonly occur from using ClF3 as a cleaning gas. Chemraz ® XTR addresses application challenges typically found in ALD (atomic layer deposition) of titanium nitride and other nitride-based film deposition. With its unique molecular composition combined with fillers, it provides the highest available chemical resistance to thermal cleaning processes using ClF3, resulting in minimal contamination, minimal weight loss, and longer seal lifetime. This means less downtime and higher wafer-processing yields. Chemraz ® XTR is recommended for both static and semi- dynamic applications in systems used for film deposition and etching, specifically for ALD of new barrier layers for advanced devices. These layers consist of materials that are difficult to etch; therefore, ClF3 is employed for cleaning. Chemraz ® XTR has high chemical resistance to corrosive fluorine-based chemistries at elevated temperatures. In addition, Chemraz ® XTR remains stable to service temperatures exceeding 572°F (300°C) while demonstrating exceptional compression set resistance. This combination of excellent chemical resistance and low compression set in the extremely elevated temperatures found in process chambers extends seal longevity.