Chemraz 657
Specifically developed to meet the demands of aggressive dry plasma systems, Chemraz ® 657 perfluoroelastomer’s unique formulation provides enhanced plasma resistance and minimal contamination, resulting in less downtime and higher wafer processing yields. Recommended primarily for both static and dynamic oxide etch wafer processing applications, Chemraz ® 657 remains stable at service temperatures up to 536°F (280°C) with excursions to 572°F (300°C).
一般属性
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物料形态
已商用：当前有效
文档
description
Technical Datasheet (English)
下载文档可用性
北美洲
用途
密封件
其他属性
形式, 密度 / 比重, 50%拉伸应力, 拉伸应力（在100％时）, 抗张强度, 断裂伸长率, 压缩永久变形, 肖氏硬度, 其他性能
加工
Find specific processing information for Chemraz as well as general information for the 全氟化橡胶 (PFE) generic family. 注册 或 登录 了解更多信息。
