Chemraz XTR
Chemraz ® XTR is recommended for both static and semi- dynamic applications in systems used for film deposition and etching, specifically for ALD of new barrier layers for advanced devices. These layers consist of materials that are difficult to etch; therefore, ClF3 is employed for cleaning. Chemraz ® XTR has high chemical resistance to corrosive fluorine-based chemistries at elevated temperatures. In addition, Chemraz ® XTR remains stable to service temperatures exceeding 572°F (300°C) while demonstrating exceptional compression set resistance. This combination of excellent chemical resistance and low compression set in the extremely elevated temperatures found in process chambers extends seal longevity.
一般属性
使用 Prospector 建立免費帳戶時,可造訪 Chemraz XTR 的完整資料表詳細資訊。您將找到有關物理、機械和硬度規格的完整資訊
Technical Datasheet (English)
下载文档加工
Find specific processing information for Chemraz as well as general information for the 全氟化橡胶 (PFE) generic family. 注册 或 登录 了解更多信息。