3M™ Dyneon™ PFE 81TZ, PFE 131TZ and PFE 191TZ are technically advanced high temperature perfluorelastomers (HT PFE). They are designed to meet the challenges of higher temperature applications. They are classified as FFKM per ASTM D1418. Their fully fluorinated backbone structures provide a very broad chemical and thermal stability. Features and Benefits - Upper use temperature of 315°C - Can be compounded to pass AMS 7257D - Ideal for dry side (thermal processes) semiconductor applications including plasma, and high temperature CPI and aerospace applications - Low metal ion content with low extractables

3M™ Dyneon™ PFE 132TBZ is a technically advanced high temperature perfluorelastomer (HT PFE). It is designed to meet the challenges of higher temperature plasma applications. It is classified as FFKM per ASTM D1418. Its fully fluorinated backbone structure provides a very broad chemical and thermal stability. Features and Benefits - Upper use temperature of 315°C - Excellent compression set resistance offering enhanced sealing force retention and seal life - Ideal for dry side (thermal processes) semiconductor applications including plasma - Low metal ion content with low extractables

3M™ Dyneon™ PFE 133TBZ is a technically advanced high temperature perfluorelastomer (HT PFE). It is designed to meet the challenges of higher temperature plasma applications. It is classified as FFKM per ASTM D1418. Its fully fluorinated backbone structure provides a very broad chemical and thermal stability. Features and Benefits - Upper use temperature of 315°C - Excellent compression set resistance offering enhanced sealing force retention and seal life - Ideal for dry side (thermal processes) semiconductor applications including plasma - Low metal ion content with low extractables

3M™ Dyneon™ PFE 81TZ, PFE 131TZ and PFE 191TZ are technically advanced high temperature perfluorelastomers (HT PFE). They are designed to meet the challenges of higher temperature applications. They are classified as FFKM per ASTM D1418. Their fully fluorinated backbone structures provide a very broad chemical and thermal stability. Features and Benefits - Upper use temperature of 315°C - Can be compounded to pass AMS 7257D - Ideal for dry side (thermal processes) semiconductor applications including plasma, and high temperature CPI and aerospace applications - Low metal ion content with low extractables

Features and Benefits - Proprietary polymer and catalyst system enables the manufacture of optically clear finished parts - Phosphorous-free and silica-free formulation reduces the potential for contamination - Low extractables, low outgassing, and low particle generation for ultra high purity applications - Excellent temperature resistance optimizes performance in extreme environments (continuous, in-service temperatures to 300°C with peaks up to 350°C) - Excellent compression set offers enhanced sealing force retention and seal life - Proportionate polymer and catalyst package simplifies the mixing process - Smaller, easy to store packages for cleanroom handling

Features and Benefits - Phosphorous-free and silica-free formulation reduces the potential for contamination - Optically transparent - Excellent plasma resistance with low particle count - Low extractables, low outgassing, and low particle generation for ultra high purity applications - Excellent temperature resistance optimizes performance in extreme environments (continuous, in-service temperatures to 300°C with peaks up to 350°C) - Excellent compression set offers enhanced sealing force retention and seal life - Smaller, easy to store packages for cleanroom handling - Proportionate polymer and catalyst simplify the mixing process

3M™ Dyneon™ PFE 40Z is a technically advanced peroxide curable perfluoroelastomer, designed to meet the challenges of demanding sealing applications. This product is designed to have improved acid, water and steam resistance over 3M™ Dyneon™ PFE 90Z, since it can be formulated without the need for an inorganic base such as zinc oxide. It is classified as FFKM per ASTM D1418. Its fully fluorinated backbone structure provides a very broad chemical and thermal stability. Features and Benefits - Ideal for wet chemical, fluid handling, cleaning and chemical etching processes for CPI, aerospace and semiconductor manufacturing - Good compression set resistance - Upper use temperature of 220°C - Low metal ion content with low extractables in a wide range of chemicals

3M™ Dyneon™ PFE 4131TZ is an incorporated cure high temperature perfluorelastomer (HT PFE). It is designed to meet the challenges of higher temperature applications. It is classified as FFKM per ASTM D1418. Its fully fluorinated backbone structure provides a very broad chemical and thermal stability. Features and Benefits - PFE 131TZ compounded with curative for ease in manufacturing - Upper use temperature of 315°C - Excellent compression set resistance - Can be compounded to pass AMS 7257D - Ideal for dry side (thermal processes) semiconductor applications, including plasma, and high temperature CPI and aerospace applications - Low metal ion content with low extractables\

3M™ Dyneon™ PFE 60Z is a technically advanced peroxide curable perfluoroelastomer, designed to meet the challenges of demanding sealing applications. Its fully fluorinated backbone structure provides a very broad chemical and thermal stability. Low viscosity provides good mold flow and is ideal for molding large parts. It is classified as FFKM per ASTM D1418. Features and Benefits - Improved mold flow and knitting over 3M™ Dyneon™ PFE 80Z and PFE 90Z - Ideal for wet chemical, fluid handling, cleaning and chemical etching processes, and for large parts for CPI and aerospace - Good compression set resistance - Upper use temperature of 220°C - Low metal ion content with low extractables in a wide range of chemicals - Can be utilized to adjust Mooney when using PFE 80Z or PFE 90Z

3M™ Dyneon™ PFE 80Z is a technically advanced peroxide curable perfluoroelastomer. This product is designed to have improved acid resistance and lower metal ion extractables, making it ideal for wet process electronics manufacturing such as semiconductor and flat panel display. It is classified as FFKM per ASTM D1418. Its fully fluorinated backbone structure provides a very broad chemical and thermal stability. Features and Benefits - Very low metal ion content with low extractables in a wide range of chemicals - Ideal for wet chemical, fluid handling, cleaning and chemical etching processes and for semiconductor manufacturing - Can be compounded for better acid resistance than PFE 90Z - Upper use temperature of 200°C

3M™ Dyneon™ PFE 81TZ, PFE 131TZ and PFE 191TZ are technically advanced high temperature perfluorelastomers (HT PFE). They are designed to meet the challenges of higher temperature applications. They are classified as FFKM per ASTM D1418. Their fully fluorinated backbone structures provide a very broad chemical and thermal stability. Features and Benefits - Upper use temperature of 315°C - Can be compounded to pass AMS 7257D - Ideal for dry side (thermal processes) semiconductor applications including plasma, and high temperature CPI and aerospace applications - Low metal ion content with low extractables

3M™ Dyneon™ PFE 90Z is a technically advanced peroxide curable perfluoroelastomer, designed to meet the challenges of demanding sealing applications. It is classified as FFKM per ASTM D1418. Its fully fluorinated backbone structure provides a very broad chemical and thermal stability. Features and Benefits - Ideal for wet chemical, fluid handling, cleaning and chemical etching processes for CPI and aerospace - Good compression set resistance - Upper use temperature of 220°C - Low metal ion content with low extractables in a wide range of chemicals

Chemraz ® 513 is recommended for a wide variety of semiconductor equipment dry processing applications where seal reliability with minimal contamination is required. The material offers excellent performance in static plasma, photolithography, and diffusion processes where temperatures do not exceed 410°F (210°C) and high-sealing loads are not used. The hardness of this material allows for some hardware finish inconsistency.

Greene Tweed’s Chemraz ® 514, a perfluoroelastomer, is a white specialty compound, perfect for applications where contamination from carbon black must be prevented. Chemraz ® 514 offers a Shore A hardness value of 70. Because of its wide temperature range, -22°F to 428°F (-30°C to 220°C), Chemraz ® 514 is ideally suited for applications ranging from mechanical seals to valves. Available for use as o-rings, gaskets, and many other custom shapes.

Greene Tweed’s Chemraz ® 517, a perfluoroelastomer, is a white specialty compound, perfect for applications where contamination from carbon black must be prevented. Chemraz ® 517 has a Shore A hardness value of 80. Because of its wide temperature range, -22°F to 428°F (-30°C to 220°C), Chemraz ® 517 is well suited for use in a range of applications, from mechanical seals to mixers. Available for use as o-rings, gaskets, and many other custom shapes.

Chemraz ® 520 is recommended for a wide variety of semiconductor equipment dry processing applications where seal reliability with minimal contamination is required. Chemraz ® 520 offers excellent performance in static and dynamic plasma and diffusion processes as well as static photolithography processes. Chemraz ® 520 is formulated for use in high sealing load applications and where temperatures do not exceed 464°F (240°C). Due to the hardness of this material, low-temperature applications may require smoother hardware surface finishes of 10 microinches (Ra) and below.

Greene Tweed’s Chemraz ® 541 is a universal, high-strength black compound designed for demanding applications. It boasts excellent chemical and compression set resistance and operates at temperatures up to 446°F/230°C. Thanks to its broad chemical compatibility, temperature range, and shape versatility, Chemraz ® 541 is an ideal choice for demanding environments and processes. Chemraz ® 541 maintains its properties when exposed to acids, acrylates, alcohols, aldehydes, amines, aromatics, esters, ethers, halogens, ketones, hot water, and steam. We leverage compounding experience, manufacturing expertise, and engineering knowledge to ensure customers receive the optimal material and design for their application. Greene Tweed's scientists and engineers are careful and methodical in the development of new compounds, undertaking numerous studies of processing variability to ensure our manufacturing team can deliver a consistent, quality product.

Chemraz ® 543 is recommended for a wide variety of semiconductor equipment dry processing applications where seal reliability with minimal contamination is required. It offers excellent performance in etching, metalization, and diffusion processes where temperatures do not exceed 410°F (210°C). The hardness of this material allows for some hardware finish inconsistency.

Chemraz ® 550 is recommended for use in wet systems where chemical compatibility is required and small amounts of contamination are acceptable. This seal material has a wide variety of uses in dynamic or static processing equipment applications with service temperatures up to 410°F (210°C).

With its broad chemical resistance, Chemraz ® 551 is ideally suited as a universal sealing material for both aqueous and dry semiconductor wafer processing and chemical/DI water distribution systems. With the lowest outgassing profile for perfluoroelastomer materials in high-temperature applications, Chemraz ® 551 provides a cleaner process environment. Because of its reduced surface stiction, it can be used for semi-dynamic and static applications. Chemraz ® 551 remains stable at operating temperatures up to 572°F (300°C), while maintaining exceptional compression set. Chemraz ® 551 provides a significantly wider operational band and superior compression set resistance than any other broad range perfluoroelastomer on the market. With an upper temperature limit of 600°F (316°C), it’s the elastomer of choice for the most demanding applications from ozonated DI water to hot sulfuric resist strip. Chemraz ® 551 withstands the extreme thermal challenges typically found in LPCVD (low-pressure chemical vapor deposition), RTP (rapid thermal process), and epitaxial deposition systems. Chemraz ® 551's broad chemical resistance and high-temperature performance result in increased seal integrity, longer seal lifetimes, reduced downtimes, and higher wafer processing yields.

With its broad chemical resistance, Chemraz ® 555, a perfluoroelastomer, is ideally suited for challenging fluid handling applications. Chemraz ® 555 provides a significantly wider operational band and superior compression set resistance than any other broad range perfluoroelastomer on the market. With an upper temperature limit of 600°F (316°C), Chemraz ® 555 is the elastomer of choice for the most demanding services found in the chemical process and refining industries and semiconductor SubFabs. Chemraz ® 555 is suitable for use in a wide variety of media, including acids, caustics, aldehydes, esters, ethers, aromatics, hot water, steam, amines, methanol, ketones, TBA, MTBE, and mixed process streams. Chemraz ® 555 is one of Greene Tweed’s many cost-effective products and services that extend the reliability and life of our customers’ equipment in hostile conditions while protecting the public and the environment from unwanted emissions. Chemraz ® 555 is available in o-rings, gaskets, and many other custom shapes.

Chemraz ® 570 is recommended for a wide variety of semiconductor equipment wet processing applications where stringent seal reliability and contamination control is required. The material offers excellent performance in long-term static photolithography, acid/solvent, and ultrapure H2O applications.

Chemraz ® 571 is recommended for a wide variety of semiconductor equipment wet processing applications where stringent seal reliability and contamination control are required. It offers excellent performance in long-term static sealing applications in acid, solvent, and ultrapure H2O. Chemraz ® 571 is excellent for high-sealing load designs.

Greene Tweed’s Chemraz ® 584, a cream-colored perfluoroelastomer, is a specialty compound formulated to outlast the most demanding chemical process applications. Because of its outstanding overall chemical resistance, Chemraz ® 584 is the elastomer of choice for chlorine, ozone, strong oxidation fluids, and hot aqueous solutions. Its recommended temperature range is -22°F to 428°F (-30°C to 220°C). This unique cream compound is perfect for applications where contamination from carbon black must be prevented. Chemraz ® components are available for use as o-rings, gaskets, and many other custom shapes.

Chemraz ® 585, a perfluoroelastomer, is a specialty cream compound formulated to outlast the most demanding chemical process applications. With its outstanding overall chemical resistance, Chemraz ® 585 is the elastomer of choice for strong oxidation fluids and hot aqueous solutions. Its recommended temperature rangeis -22°F to 428°F (-30°C to 220°C). Chemraz ® components are available for use as o-rings, gaskets, and many other custom shapes.

Chemraz ® 592, a versatile perfluoroelastomer developed with a proprietary filler system, is very resistant to plasma attack. This compound’s durometer allows for some hardware finish inconsistency and higher sealing loads. It is well suited for critical seals in static and dynamic dry applications where reliability and purity are equally essential. Chemraz ® 592 is recommended for applications with service temperatures up to 464°F (240°C).

Chemraz ® 600, a perfluoroelastomer, works well in both high and low temperatures. It is capable of withstanding temperatures ranging from -4°F to 500°F (-20°C to 260°C). In addition, Chemraz ® 600 provides unparalleled performance in hot water and steam. Because of its high durometer rating (Shore A 90), components made from Chemraz ® 600 offer greater resistance in high-pressure and aggressive environments. Chemraz ® 600 has an extremely broad chemical resistance range and is made from a high-density base polymer. Chemraz ® 600 offers a low compression set and is perfect for sealing at high pressures. Components made from Chemraz ® 600 are available for use as o-rings, gaskets, and many other custom shapes.

Chemraz ® is a black synthetic rubber used to make high-performance seals and flexible parts with chemical and thermal compatibility similar to PTFE. Chemraz ® 605 is an ideal material for seals in in-vitro diagnostic (IVD), histology, analytical, and lab instrumentation. Seals made from Chemraz ® 605 maintain performance in nearly all relevant solvent and temperature combinations, typically for orders of magnitude longer than other seal materials, such as EPDM, silicone, or FKM.

Greene Tweed’s Chemraz ® 615 exhibits outstanding high temperature properties, with a temperature range from 0°F to 615°F (-18°C to 324°C). Chemraz ® 615’s chemical resistance and low compression set characteristics combine to out perform tin-cured FFKMs. Chemraz ® 615 shows lower compression set at high temperatures and a higher retained sealing force than other available FFKMs. Because Chemraz ® 615 allows for the use of higher process operating temperatures, it is ideal for a range of markets, from chemical process to petroleum refining. This superior FFKM performs well in a variety of fluids, such as inorganic and organic chemicals, acids, reagents, heat transfer fluids, and hydrocarbons. Chemraz ® 615 is available in standard o-rings and custom shapes for a range of equipment, from pumps and valves to agitators and mixers, from mechanical seals and process control instruments to heat exchangers and diagnostic equipment.

Chemraz ® 629 FFKM is specifically developed by Greene Tweed to meet the rigorous demands of aggressive plasma systems. Its unique formulation provides enhanced plasma resistance in oxygen and fluorine plasma processes, resulting in minimal contamination, less downtime, and higher wafer processing yields. Chemraz ® 629 is developed from an advanced polymer using fluoro-polymer nano-composite technology particles. Recommended for both static and dynamic dry wafer processing applications such as etch, remote plasma cleans, and deposition (CVD, HDPCVD) with challenging gland designs and reduced sealing loads, it remains stable at service temps to 500°F (260°C).

Chemraz ® 639 perfluoroelastomer is specifically developed by Greene Tweed to meet the rigorous demands of aggressive plasma systems. Its unique formulation provides enhanced plasma resistance in oxygen and fluorine plasma processes, resulting in minimal contamination, less downtime, and higher wafer processing yields. Chemraz ® 639 is developed from an advanced polymer using fluoro-polymer nano-composite technology particles. Recommended for both static and dynamic dry wafer processing applications such as etch, remote plasma cleans, and deposition (CVD, HDPCVD), Chemraz® 639 remains stable at service temperatures up to 500°F (260°C).

With its broad chemical resistance, Chemraz ® 555, a perfluoroelastomer, is ideally suited for challenging fluid handling applications. Chemraz ® 555 provides a significantly wider operational band and superior compression set resistance than any other broad range perfluoroelastomer on the market. With an upper temperature limit of 600°F (316°C), Chemraz ® 555 is the elastomer of choice for the most demanding services found in the chemical process and refining industries and semiconductor SubFabs. Chemraz ® 555 is suitable for use in a wide variety of media, including acids, caustics, aldehydes, esters, ethers, aromatics, hot water, steam, amines, methanol, ketones, TBA, MTBE, and mixed process streams. Chemraz ® 555 is one of Greene Tweed’s many cost-effective products and services that extend the reliability and life of our customers’ equipment in hostile conditions while protecting the public and the environment from unwanted emissions. Chemraz ® 555 is available in o-rings, gaskets, and many other custom shapes.

Chemraz ® 656 is a low durometer perfluoroelastomer primarily designed for bonded slit valve gates and special engineered applications such as low sealing forces/tolerance stackups where softer materials aid in the total seal solution. Developed from an advanced polymer using fluoropolymer nano-composite technology particles, Chemraz ® 656 has very low metallic ion levels and offers unsurpassed resistance to today’s advanced process chemistries. Chemraz ® 656 is recommended for use in CVD, etch, and diffusion equipment applications.

Specifically developed to meet the demands of aggressive dry plasma systems, Chemraz ® 657 perfluoroelastomer’s unique formulation provides enhanced plasma resistance and minimal contamination, resulting in less downtime and higher wafer processing yields. Recommended primarily for both static and dynamic oxide etch wafer processing applications, Chemraz ® 657 remains stable at service temperatures up to 536°F (280°C) with excursions to 572°F (300°C).

Chemraz ® 663, a perfluoroelastomer (FFKM), is engineered to withstand low-temperature Etch and Deposition applications where plasma resistance and the ability to maintain sealing force in a vacuum are critical, such as electrostatic chuck assemblies.